Structure and optical properties of the WO3 thin films deposited by the GLAD magnetron sputtering technique

A.Rydosz, K.Dyndał, K.Kollbek, W.Andrysiewicz, M.Sitarz, K.Marszałek
Vacuum, Volume 177, 109378 (2020)
tekst: https://doi.org/10.1016/j.vacuum.2020.109378
linia badawcza: VII