SCOPE: 

The two-years workshop of Focused Electron Beam Induced Processing (FEBIP) is dedicated to recent advances in 3D additive manufacturing and etching with focused electron beams at the nanoscale.

This workshop will include following thematic sessions: 

FEBIP fundamentals:

e.g. interaction of low energy electrons with condensed matter electron-matter interactions, Monte Carlo simulations and continuum models. 

Advances in 3D nanofabrication:

Experimental tools, new computational methods.

Etching:

Intentional knock-on doping of materials using inert plasma FIB.

Applications:

Hybrid superconducting-ferromagnetic nanostructures.

Perspectives:

Electron-enhanced atomic layer deposition FEBIP processes.

Keynote Speakers: 

Prof. Howard Fairbrother

(Johns Hopkins University, United States):

Electrons/Ions Stimulated Surface Reactions of Organometallic Precursors

Prof. Sven Barth

(Goethe University Frankfurt, Germany):

Precursors for direct-write nanofabrication with electrons

Dr. Katja Höflich

(Ferdinand-Braun-Institut gGmbH, Germany):

Direct electron beam writing of metallic nanostructures and insight gained from surface deposition techniques

Prof. Harald Plank

(Graz University of Technology; Austria):

3D printed nanostructures with focused electron beams 

Prof. Milos Toth

(University of Technology Sydney, Australia):

Nanofabrication and knock-on doping using an inert plasma FIB and solid/gaseous precursors

Prof. José María De Teresa

(CSIC, Spain):

Recent advances in superconducting FIBID nanostructures and Cryo-FIBID

Prof. Oleksandr Dobrovolskiy

(University of Vienna, Austria):

Hybrid superconductor/ferromagnetic structures

Prof. Steven George

(University of Colorado, United States):

Electron-enhanced atomic layer deposition